RONACLEAN™ EVP-206 ACID CLEANER is a one-component, environmentally-friendly product that removes residues from aqueous, alkali strippable dry films, and is compatible with pattern plating processes.

用于：用于PWB金属化应用用于水性碱性可剥离干膜的清洁优点：非常有效地去除显影剂残留物无干膜攻击配合剂免费浪费处理改善漂洗性兼容罗门哈斯电子材料酸铜电解液可用性：亚太地区

Used In:

For PWB metallization applications

For the cleaning of aqueous, alkali strippable dry films

Advantages:

Highly effective in removing developer residues

No attack of dry films

Free from complexing agents

Ease of waste treatment

Improved rinsability

Compatible with Rohm and Haas Electronic Materials' acid copper electrolytes

Availability:

Asia Pacific